Film Thickness Measurement

Spectra FX-100 / 200

The spectraFX 100 system is a production-oriented tool designed to characterize the  complex film stacks used  in semiconductormamufauring processes.
MODEL Spectra FX-100 Spectra FX-200
Maker KLA-Tencor
Wafer sizes 100-200 mm Open Cassette
200-300mm Foup system
Measurement system DBS / SE / Stress (optional) / SWE (optional)
Illumination sources
  • Broadband Xenon Arc Lamp
  • Deuterium Lamp (optional)
  • HeNe Laser (SWE option)
Objectives Automatic, 3-position turret : 1X, 4X, 15X Automatic, 3-position turret : 1X, 4X, 15X,
Pattern Reg : 2X
Beam Spot
  • DBS : 40, 10, 2.7 um
  • SE : Measure within a 50 um well
Focus Automatic focus on measurement site
Computer Pemtium III 450MHz
8.0GB SCSI hard drive
Pemtium IV 2.8GHz
160GB IDE hard drive

Company Name: SMART&S ㅣ Address: A-1705, Heungdeok IT Valley, 13, Heungdeok 1-ro, Giheung-gu, Yongin-si, Gyeonggi-do, 16954, Korea ㅣ President: Richard Lim | TEL: 82-31-8065-5959 ㅣ FAX: 82-31-8065-5989

© Copyright 2018. SMART&S All Rights Reserved.