Film Thickness Measurement
Spectra FX-100 / 200
The spectraFX 100 system is a production-oriented tool designed to characterize the
complex film stacks used in semiconductormamufauring processes.
SPECIFICATIONS
| MODEL | Spectra FX-100 | Spectra FX-200 |
|---|---|---|
| Maker | KLA-Tencor | |
| Wafer sizes |
100-200 mm Open Cassette 200-300mm Foup system |
|
| Measurement system | DBS / SE / Stress (optional) / SWE (optional) | |
| Illumination sources |
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|
| Objectives | Automatic, 3-position turret : 1X, 4X, 15X |
Automatic, 3-position turret : 1X, 4X, 15X, Pattern Reg : 2X |
| Beam Spot |
|
|
| Focus | Automatic focus on measurement site | |
| Computer |
Pemtium III 450MHz 8.0GB SCSI hard drive |
Pemtium IV 2.8GHz 160GB IDE hard drive |